• Resumo

    Análise do Comportamento Elétrico e da Robustez à Radiação de Circuitos XOR em Tecnologia Nanométrica FinFET

    Data de publicação: 04/09/2020

    ABSTRACT
    Electronic circuits are becoming more susceptible to errors
    caused by radiation due to scaling down technological node
    and high operating frequencies [4, 5, 11].This work presents
    a comparative analysis of the sensitivity radiation for
    different XOR gate topologies 16 nm. The doors were
    implemented considering two different devices:
    Complementary Metal-Oxide Semiconductor (CMOS bulk)
    and Fin Field-Effect Transistor (FinFET) and two logics:
    Complementary Logic (CMOS logic) and Logic Passage
    Transistor (PTL). To allow a more detailed comparison, this
    work also discusses the critical delay results, power and the
    Power-Delay Product (PDP), a metric that defines the
    power dissipated by the circuit to perform an operation, for
    each version of XOR. The doors PTL-based XORs showed
    superior improvements 13% for the critical delay and 11%
    for the PDP in relation to CMOS logic. The topologies of the
    PTL family still showed greater robustness against the effects
    of radiation when compared to ports implemented with
    CMOS logic, with a Linear Energy Transfer (LET) being
    almost 30% higher for CMOS devices and approximately
    20% higher for FinFET devices. In addition, circuits based
    on FinFET are about 70% faster, have a PDP 80% smaller
    and are approximately 300x more robust than CMOS
    technology, with an improvement in the LET threshold of
    both logical families evaluated.

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